A polishing slurry was prepared by using nano cerium oxide (CeO2) as abrasive,and the synergistic dispersion method of ball milling and different chemical reagents(such as the pH regulator acetic acid,propionic acid and phytic acid,and the dispersant ionic and nonionic surfactants).The dispersion performance and polishing performance of different slurry in acidic system were studied.The research shows that when using acetic acid as a pH regulator during ball milling,adjusting the pH value of the suspension to 3,the ratio of cerium oxide to milling media is 1∶4 (specify by weight),and the ball milling time to 6 h,the dispersion effect of nano CeO2 suspension after ball milling is better.Polishing experiments were carried out on quartz glass using prepared nano CeO2 polishing slurry.It is found that when polishing with 1% of CeO2 at pH 4,the material removal rate (MRR) of quartz glass attains 409 nm/min,and the roughness is 0.03 nm.Both cationic and nonionic surfactants can improve the dispersion stability of CeO.2 suspensions in acidic systems,while the addition of non-ionic surfactant AEO-9(fatty alcohol polyoxyethylene ether) has the beat effect,which can improve the polishing surface quality of quartz glass when improving the dispersion stability of the polishing slurry.