Abstract:In order to prepare a special polishing slurry suitable for ultrasonic fine atomization polishing of JGS1 optical quartz glass,the orthogonal experiment was designed to explore the influence of the content of each component in the polishing slurry on the atomization polishing effect,and the material removal mechanism was briefly analyzed.The results show that the order of influence degree on the material removal rate is SiO2,pH value,cosolvent,complexing agent and surfactant,the order of influence degree on the surface roughness is SiO2,surfactant,pH value,cosolvent and complexing agent.When the mass fraction of SiO2 abrasive is 19%,the mass fraction of citric acid cosolvent is 1.4%,the mass fraction of guanidine carbonate complexing agent is 0.2%,the mass fraction of polyvinylpyrrolidine surfactant is 0.9%,and pH value is 11,the best atomization polishing effect is got,and the material removal rate is 169.5 nm/min,the surface roughness is 0.73 nm.In the removal process,the quartz glass reacts with the polishing slurry in alkaline environment to form a soft layer lower than the bulk harness,which is easy to be removed by abrasive mechanical action.Traditional chemical mechanical polishing and ultrasonic atomization chemical mechanical polishing was performed by using the prepared polishing slurry to compare the polishing effect.It is found that the polishing effects of the two methods are similar,but the amount of polishing fluid in ultrasonic atomization method is only 1/7 of that in traditional polishing method.